Notice of Prospective Grant of Exclusive Patent License

摘要

This is a notice in accordance with 35 USC 209(c)(1) and 37 CFR 404.7(a)(1)(i) that the National Institute of Standards of Technology (``NIST''), U.S. Department of Commerce, is contemplating the grant of an exclusive license world-wide to NIST's interest in the invention embodied in U.S. Patent Application 09/034,918 titled, ``Method And Apparatus for Diffraction Measurement Using A Scanning X- Ray Source'', filed March 4, 1998; NIST Docket No. 97-026US to Digiray Corporation, having a place of business at 2239 Omega Road, San Ramon, CA. The grant of the license would be for all fields of use.