Regulation & law · 19/10/1998
NIST to Grant Exclusive Patent License to Digiray Corporation
The National Institute of Standards of Technology (NIST) is considering granting an exclusive worldwide patent license to Digiray Corporation for its interest in a U.S. patent application related to diffraction measurement using a scanning X-ray source, filed in 1998.
Original source language: Federal Register — All DocumentsOpen original release →