Radcal Corp., Prospective Grant of Exclusive Patent License

摘要

This is notice in accordance with 35 U.S.C. 209(c)(1) and 37 CFR 404.7(a)(1)(i) that the National Institute of Standards and Technology (``NIST''), U.S. Department of Commerce, is contemplating the grant of an exclusive license in the United States to practice the invention embodied in U.S. Patent Application 08/021,232, titled ``Method and Apparatus for Precisely Measuring Voltages Applied to X- Ray Sources'' to Radcal Corporation, having a place of Business in Monrovia, California.